Ta-Si-C 非晶質擴散阻障應用於 銅製程之特性研究 = Charac...
Jau-Shiung Fang

 

  • Ta-Si-C 非晶質擴散阻障應用於 銅製程之特性研究 = Characteristics of amorphous Ta-Si-C film as a diffusion barrier for copper metallization
  • Record Type: Language materials, printed : monographic
    Paralel Title: Characteristics of amorphous Ta-Si-C film as a diffusion barrier for copper metallization
    Author: 蘇武加,
    Secondary Intellectual Responsibility: 方昭訓,
    Place of Publication: 雲林縣
    Published: 國立虎尾科技大學;
    Year of Publication: 民99[2010]
    Edition: 初版
    Description: 125面圖 : 30公分;
    Subject: Ta-Si-C 薄膜
    Subject: 電漿表面改質
    Subject: Ta-Si-C(O)x
    Subject: 熱穩定性
    Subject: Ta-Si-C
    Subject: plasma surface treatment
    Subject: thermal stability
    Subject: Ta-Si-C(O)x
    Online resource: http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-2008201016381700
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  • 2 records • Pages 1 •
 
T001984 圖書館B1F 博碩士論文專區 不流通(NON_CIR) 碩士論文(TM) TM 008.152M 4414 99 一般使用(Normal) On shelf 0
T001985 圖書館B1F 可外借論文區 不流通(NON_CIR) 一般圖書 008.152M 4414 99 一般使用(Normal) On shelf 0
  • 2 records • Pages 1 •
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