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調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(N...
~
陳坤煌
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /
Record Type:
Language materials, printed : Monograph/item
Title/Author:
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 =/ 陳坤煌.
Reminder of title:
Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /
remainder title:
Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co.
Author:
陳坤煌
Published:
雲林縣 :國立虎尾科技大學 , : 民110.07.,
Description:
[12], 130葉 :圖, 表 ; : 30公分.;
Notes:
指導教授: 方昭訓.
Subject:
Surface-Limited Redox Reaction. -
Online resource:
電子資源
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /
陳坤煌
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 =
Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co.陳坤煌. - 初版. - 雲林縣 :國立虎尾科技大學 ,民110.07. - [12], 130葉 :圖, 表 ;30公分.
指導教授: 方昭訓.
碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士班.
含參考書目.
(平裝).Subjects--Topical Terms:
1215704
Surface-Limited Redox Reaction.
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /
LDR
:01096cam a2200217 i 4500
001
1040416
008
211125s2021 ch ak erm 000 0 chi d
035
$a
(THES)109NYPI0159009
040
$a
NFU
$b
chi
$c
NFU
$e
CCR
041
0 #
$a
chi.
084
$a
008.152M
$b
7549:2 110
$2
ncsclt
100
1
$a
陳坤煌
$3
1338136
245
1 0
$a
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 =
$b
Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /
$c
陳坤煌.
246
1 1
$a
Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co.
250
$a
初版.
260
#
$a
雲林縣 :
$b
國立虎尾科技大學 ,
$c
民110.07.
300
$a
[12], 130葉 :
$b
圖, 表 ;
$c
30公分.
500
$a
指導教授: 方昭訓.
500
$a
學年度: 109.
502
$a
碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士班.
504
$a
含參考書目.
563
$a
(平裝).
650
# 4
$a
Surface-Limited Redox Reaction.
$3
1215704
650
# 4
$a
Underpotential Deposition.
$3
1215703
650
# 4
$a
EC-ALD.
$3
1346160
650
# 4
$a
Interconnects.
$3
1346159
650
# 4
$a
Co(Ni) alloy films.
$3
1346158
650
# 4
$a
表面侷限氧化還原置換.
$3
1245707
650
# 4
$a
低電位沉積.
$3
1011312
650
# 4
$a
電化學原子層沉積.
$3
1011300
650
# 4
$a
連導線.
$3
1011310
650
# 4
$a
鈷鎳合金薄膜.
$3
1346157
856
7 #
$u
https://handle.ncl.edu.tw/11296/sk8w5z
$z
電子資源
$2
http
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圖書館B1F 博碩士論文專區
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T011616
圖書館B1F 博碩士論文專區
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碩士論文(TM)
TM 008.152M 7549:2 110
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