thermal stability.
Overview
Works: | 11 works in 11 publications in 11 languages |
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Titles
氮化鋁鉻鉬與氮化鈦矽奈米多層薄膜的耐高溫和機械性質分析 = = Analyses of thermal stabilities and mechanical properties of AlCrMoN/TiSiN nanolayered coatings /
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多層氮化鋁鈦硼與氮化鋁鉻硼薄膜之機械性質與鈦合金切削分析 = = Analyses of the Mechanical Properties and Titanium Alloy Machining of Multilayer AlTiBN/AlCrBN Coatings /
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利用電漿增強化學氣相沉積法製備氫化碳氧化矽薄膜之研究 = = Study on the Preparation of Hydrogenated Silicon Oxy-Carbon Films Using Plasma-Enhanced Chemical Vapor Deposition /
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陰極電弧蒸鍍多層氮化鋁鉻硼與氮化鋁鈦矽薄膜之熱穩定與抗氧化能力研究 = = Thermal Stability and Oxidation Behavior of AlCrBN/AlTiSiN Coatings Prepared by Cathodic Arc Evaporation /
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Cu/WOx/AlOx太陽能選擇性吸收體之製備研究 = = Fabrication of Cu/WOx/AlOx Solar Selective Absorbers /
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Cu/MoONx/MoOx/AlOx太陽能選擇性吸收體之製備研究 = = Fabrication of Cu/MoONx/MoOx/AlOx Solar Selective Absorbers /
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以電化學原子層沉積Cu(Mn)薄膜的研究 = = Studies of Cu(Mn) Thin Film by Electrochemical Atomic Layer Deposition (EC-ALD) /
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電化學沉積銀銅合金薄膜特性探討 = = Characteristics and Preparation of Electrochemical Deposition Ag(Cu) Film /
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反應式磁控濺鍍製備CrN(H)/CrN(L)/CrON/AlO多層堆疊選擇性吸收薄膜之高溫性能研究 = = High-temperature Performances of The Spectrally Selective CrN(H)/CrN(L)/CrON/AlO Tandem Absorption Thin Film Prepared by Reactive Magnetron Sputtering /
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電化學共沉積Cu(Mn)合金薄膜之特性 = = Cu(Mn) Alloy Thin Films Prepared by Electrochemical Co-deposition /
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添加鋁對氮氧化鉻薄膜光學性質及熱穩定性的影響 = = Influence of Doping Aluminum on Optical Properties and Thermal Stability of Chromium Oxynitride Films /
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