Interconnects.
Overview
| Works: | 4 works in 4 publications in 4 languages | |
|---|---|---|
Titles
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /
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(Language materials, printed)
調控低電位沉積層狀製備下世代Co(Ru)合金連導線薄膜 = = Fabrication of Co(Ru) Interconnect Thin Film by Manipulating Monolayer Underpotential Deposition /
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(Language materials, printed)
透過控制鈷和釕的低電位沉積在TiSi2上逐層沉積鈷釕合金薄膜 = = Layer-by-layer deposition of Co(Ru) Films on TiSi2 Substrate by Sequentially Manipulating Underpotential Deposition of Co and Ru /
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(Language materials, printed)
以原子層置換法實現微量摻雜銅之鈷合金薄膜特性 = = Characteristics of Cobalt Alloy Thin Films with Trace Copper Doping via Atomic Layer Replacement Method /
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(Language materials, printed)
Subjects