Interconnects.

調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co / by: (書目-語言資料,印刷品)

調控低電位沉積層狀製備下世代Co(Ru)合金連導線薄膜 = = Fabrication of Co(Ru) Interconnect Thin Film by Manipulating Monolayer Underpotential Deposition / by: (書目-語言資料,印刷品)

透過控制鈷和釕的低電位沉積在TiSi2上逐層沉積鈷釕合金薄膜 = = Layer-by-layer deposition of Co(Ru) Films on TiSi2 Substrate by Sequentially Manipulating Underpotential Deposition of Co and Ru / by: (書目-語言資料,印刷品)

電化學原子層沉積.

半導體互連導線.

表面侷限氧化還原置換.

鈷鎳合金薄膜.

Co(Ru) alloy films.

Interconnects.

低電位沉積.

鈷釕合金薄膜.

Surface-Limited Redox Reaction.

Co(Ru) alloy thin films.

Co(Ni) alloy films.

Underpotential Deposition.

EC-ALD.

連導線.